CVP21 Supports the COMPLETE Spectrum of Materials:
- Group IV semiconductors: Silicon (Si), Germanium (Ge), Silicon Carbide (SiC)
- III-V Semiconductors: Gallium Arsenide (GaAs), Indium Phosphide (InP), Gallium Phosphide (GaP), ...
- Ternary III-V alloys: Aluminum Gallium Arsenide (AlGaAs), Gallium Indium Phosphide (GaInP), Aluminium Indium Arsenide (AlInAs) ...
- Quaternary III-V alloys as Aluminum Gallium Indium Phosphide (AlGaInP), ...
- Nitrides, as Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), Indium Gallium Nitride (InGaN), Aluminum Indium Nitride (AlInN)
- II-VI semiconductors: Zinc Oxide (ZnO), Cadmium Telluride (CdTe), Mercury Cadmium Telluride (HgCdTe, MCT)...
- Exotics Semiconductors (please contact us for sample measurements)
CVP21 Supports the COMPLETE Sample Range:
- Stacked layers are no problem (the material, the doping and the doping type may vary).
- No Restrictions concerning the substrate (may be conductive or insulating).
- Sample size: 4*2 mm² to complete 8" wafer size are standard (smaller samples on request).
CVP21 Supports the COMPLETE Resolution Range:
- Concentration resolution < 1012 cm-3 to > 1021 cm-3 (*).
- Depth resolution
1 nm to 100 µm (*).
(*) may depend on material type/ sample quality.
CVP 21 comes as a COMPLETE measurement system:
- High Reliability system (special concern on electronics, mechanics, optics and fluid system).
- Calibration-free system (Complete self calibrating electronic system - no needs for cable capacitance calibration).
- Easy-to-use (Software optimized with full user management - easily used as well in production as in laboratory environment).
- Wafer-Stepping (Complete wafer stepper is optionally available - to process several measurements on a wafer in full automation).
- Camera-Control (The process is controlled on-line by a color camera - after each measurement camera data is available in film strip format).
- Recipes (Measurement recipes are pre-defined and may easily modified by a user with higher priority).
- Dry-In / Dry-Out: Auto-Load / Unload / Reload (The loading/ un-loading and re-loading of the electrochemical cell is automated and may be easily modified by user. The samples are processed dry-in / dry-out)
