Ready to be installed without
the need of a chemical bench beneath: Chemical
waste bin, basin and exhaust connection are included.
Ready
to varying user preferences: To be used either as desktop equipment or including
its own floor standing bottom with 60cm wide and 80cm deep footprint (option
FP, clean room ready shielded by polished stainless steel).
Ready
for clean room installation with an enclosure made of polished stainless steel
and an acrylic front.
Ready
for future operating systems: It uses a standard WindowsTM PC (communications
via standard RS232 and USB 2.0).
Easy
serviceable due to a clear mechanical separation of the fluid part, the optical
part and the electronics, and due to the modular design of the electronics
in a 19" rack.
Full
automatic “Dry in – Dry out“ processing of samples.
Easy
change of the newly designed sealing ring.
Ready
to deliver operator independent results: The electrochemical cell with the
precision sealing ring lid is driven gently to the semiconductor surface,
until the predefined pressing force is reached. The surface of the semiconductor
is sensed automatically, so the force does not depend on the thickness of
the semiconductor sample.
Full
automatic loading of the cell with electrolyte.
Reliable
debubbling of the semiconductor electrolyte interface. It is neither necessary
nor recommended to add any further chemicals to reduce the surface tension
of the fluids.
Full
automatic changing of the electrolyte is possible during the measurement process.
The
cell may be unloaded automatically, including an automatic washing of the
complete fluid system.
Ready
to run stand alone: A high resolution color camera delivers an optical image
of the semiconductor electrolyte interface to the PC screen (option OI).
Ready to be used by standard users:
The measurement recipe for a sample type contains the complete measurement
parameters.
Strong
help support for the operator: The state of the art Windows TM help
system includes valuable hints concerning the profiling of complicated materials
and layer combinations.
Strong
support for the operator by either full automatic, semi automatic or manual
measurement modes.
Strong
protection of the operator by varying priority levels concerning parameter
access.
Strong
support for the operator by clear placement of the relevant parameters in
each measurement window.
Continuous
on-line storage of the current process to the hard disk. Thus it is no problem
to continue a process that has been stopped by some accident.
Strong
support of reliability checking and error analysis of the measurements: The
software includes wealthy tools for recalculation and error analysis. The
measurements are delivered with error bars.
Good
interconnectivity, data and measurement files may be exported to CSV, HTML,
EMF, ready e. g. for Excel
TM, Word TM, Internet publishing.
Easy
customization, interfaces for VBScript and JavaScript are included, the measurement
reports may be edited graphically.
Easy remote control: The system may be operated from remote network locations
Fully
digitized electronics eliminates AC calibration needs. The DC electronics
is calibrated and the AC electronics is checked automatically during the self
test.
Measurement
of capacitance values either with 2 frequencies, to evaluate the complete
3 component equivalent circuit, or alternatively also with a 3rd frequency
to evaluate the 3 component equivalent circuit including error analysis.
Reliable
signals also for samples with very low doping due to Coax cabling up to the
electrochemical cell and the semiconductor.
Reliability
checking of the Schottky behavior of the electrolyte semiconductor interface
at every measurement point, thus the measurement result is delivered with
error specification.
The
optimum voltage point for the evaluation voltage may be selected by the software
automatically, thus the etching through pn junctions and many complicated
interfaces is straight forward.
High
quality Teflon TM/
PTFE is used to machine the electrochemical cell and the valves. Thus these
key components are utmost resistant against any chemicals. Particularly the
system is ready to be operated with electrolytes containing Fluorides.
The
main features of the proven traditional cell design have been kept. This cell
design delivered good ECV etch results over more than 20 years with a tremendous
number of different semiconductor layer combinations. The geometry of the
current distribution in the cell and the positioning of the electrodes are
utmost important for clean and homogeneous etching.
The
electrochemical cell is produced without any soldering, thus no corrosion
is possible to happen at the electrochemical cell.
The
debubbling procedure works reliable. Thus it is neither necessary nor recommended
to use any "soap" additives for the electrolyte or cleaning liquids.
Furthermore it is possible to run etch procedures which apply fresh electrolyte
in a continuous or repetitive manner.
The
N evaluation voltage may adapt automatically to differing semiconductor surfaces,
thus the etching through pn junctions and many complicated interfaces is straight
forward.
The
washing of the complete fluid system including the electrochemical cell is
performed automatically.
The
complete fluid system is attached to the front side of the equipment. Thus
if the acrylic front hoods are opened, the complete fluid system is easily
overlooked. Especially the peripheral of the contacted sealing ring may be
easily checked, as the acrylic front hoods may be opened during the etch process.
This also is very important for samples which are so small, that they are
at the limit to be measured (thus having dimensions of only few mm˛).
The Wafer Profiler CVP21
is the superior solution for Electrochemical Capacitance Voltage Profiling!
