• Fine focus and scanable Ion Source
• Differentially pumped
• Small spot size
• Large scan area
• Sample cleaning/etching
• Depth profiling
• ISS/LEIS
• SIMS

 

Product Description:

The IS 40E1 is an extractor type ion source, mounted on a rotatable flange DN 40CF.
The standard working distance from end of source to the sample is 23 mm. The two lens system of the source allows easy changing of the spot size, which is continuously variable. It can be operated over a primary energy range of 0.15 keV to 5 keV. Because of its very slim outline and a housing cone angle of 50° it is ideally suitable for tight environments. The filament is non-line-of-sight to the sample, thereby minimizing contamination from the source. It is field replaceable with non-critical alignment and long lifetime which makes the source serviceable by the user and hence economical. Due to this special cathode type (YttriumOxide coated Ir filament) the operation temperature of the ionizer is considerably lower than for other sources, hence reducing ion beam contamination. Additionally the cathode allows for operation with reactive gases like Oxygen, Hydrogen, and hydrocarbons.

The scanning area is 10x10 mm at the standard working distance of 23 mm. Over this area the sputter crater is extremely homogeneous. This results in precise depth profiles with maximum depth resolution. There are two ports for differential pumping. Usually the first differential pumping stage is linked with the pumping line of the second differential stage via a valve acting as a throttle. The second differential stage is connected to an UHV pumping system. This way the pressure in the analysis chamber can be maintained in the 10^-8 mbar range while the source is operating at the specified maximum beam current.

The source can be supplied complete with an UHV gas inlet with leak valve and a differential pumping system.
As an option a Wien Mass Filter for elimination of unwanted isotopes, impurities, multiple charged ions, neutral
particles can be retrofitted to the source.

Mounting Details:

• Large working distance: 23mm to 100mm
• Small cone angle of 50°
• 2.75" OD (DN38CF) Rotatable Base Flange

Technical Data:

Ion beam performance:

• Ion beam current: >= 0.8 µA in a 125 µm spot; >= 8 µA in a 800 µm spot (at 5 keV, Ar⁺)
• Two lens system for easy adjustment of spot size
• High current density, 1-4 mA/cm²
• Variable primary energy, 0.15 - 5 keV

Operation performance:

• Large scan area, 10 x 10 mm²
• Operation conditions
• Differential pumping
• Working pressure down to 10^-8 mbar range
• Suitable for reactive gases like Oxygen

Options:

• Wien Mass Filter
• Gas inlet system
• Differential pumping system
• Remote operation for depth profiling
  
  

ION SOURCE POWER SUPPLY IS-PS40E:

The Ion Source Power Supply IS-PS40E is dedicated to supply Ion Source IS30-40. Unit delivers all required
voltages for operation of the Ion Source, no additional electronics is needed. The IS-PS40E is designed for Extended Ion Sources IS40E. The power supply allows to modify ion beam profile and position. The ion source can be used for cleaning the sample or scanning with low beam profile at high or low ion energy.

Other Ion Sources:

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