Ion Source IS 40C1 for Sputter Cleaning

Ion Source IS 40C1

 


The IS 40C1 is a compact, easy-to-handle extractor type ion source optimized mostly for sample cleaning. It is mounted on a DN 40CF flange. The source is available with a digital power supply. The source generates an ion current of 10÷15µA (Argon) with a Gaussian beam profile. The beam diameter and current density depend on the source-to-sample distance. The
mounting length of the source is adaptable to individual requirements (standard 65mm). Direct Gas Inlet in the ionization area via gas line through integrated Flange (DN16CF).
The ionization filament is arranged in a non-line-of-sight configuration and allows the use of reactive gases, such as oxygen etc. The special YttriumOxide coated Ir-cathode is suitable for operation with all noble gases, N2, and reactive gases like O2, H2 and CH4. The special arrangement of the accelerating electrode and anode ensures long term stable operation of the ion source. The ion current can be varied in a wide range. The energy range of the ions is continuously variable between 0.12keV and 5 keV. The source is bakeable up to 250°C and can be degassed internally to 10 mbar within the main chamber, clean sputter conditions and reduced pumping times after sputtering.


Power Supply for IQE 11/35


Digital Power Supply IS-PS40C:


The IS-PS40C is designed for Ion Sources IS40C used for the cleaning of sample surfaces in UHV.
The unit has a simple operating menu with digital encoder for precise control the ion energy, extractor
voltage, emission current and other parameters. All parameters can be stored and recalled. The IS-PS40C
is mounted in the 19” rack (full-width, 3 units height).

Specifications:

 
  Beam Energy: 120 – 5000 eV at max 1mA; Error < 1V; Ripple < 0.2 Vpp
  Filament Current: 3 - 5.5A at max 12V
  Electron ionization current: 10µA – 10mA discrete values; Error < 2%
  Degas: Degas controlled with internal timer
  User Interface:

LCD text display 2 x 20 chars, with functions keys
Suitable digital encoder for editing precisely all parameters
Several settings of process parameters can be stored and recalled
  Communication: 2 wire EIA-485 for control all parameters by external computer
  Dimensions (W x H x D): 483 x 133 x 430 mm

 

Other Ion Sources:



SPECS Technologies Corporation
3318 Plantation Dr.
Sarasota, Florida 34231
Phone: (941) 362-4877
Fax: (941) 364-9706
support@specs.com

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