• Complete UHV Sputter Processing and and Thin Film Deposition System for Research and Production Applications
• Vacuum Deposion System with Unsurpassed UHV Vacuum Conditions and Ultimate Purity
• Magnetron Sputter Cathode Assembly with DC-, Pulsed-DC, RF Power, Magnetic or NonMagnetic Materials, Reactive Sputtering
• E-Beam Deposition, Multi-Pocket E-Guns, Thermal Evaporators with PID-Controllers for absolute Temperature Stability and Uniformity
• Automatic System Control for Multiple Wafer Deposition, Cleanroom Approved, ISO Quality Management Manufacturing
• Very Accurate Beam Flux Control with Thin Film Deposition Monitor System, Quartz Crystal Microbalance Array

Mustang Vac's Colt 48® Sputter System	Mustang VMS 1000 & 1500 Coating Systems

• Compact Design, Easy Operation, Multi Function Use
• 2-, 3-, 4- UHV Sputter Targets with optimized magnet system for ferromagnetic materials
• Computer Controlled DC-Power Supply, DC-Pulser, RF-Generator
• Fully Automated Gas Supply with Mass Flow Control Multi-Channel System and Electro-Pneumatic Valve Control Module
• Unique Co-Deposition for Multiple Materials and Rapid Substrate Processing
• Specimen Doping, Motorized Metal Deposition, Mask Aligner and Patterning
• Heatable-Coolable Substrate Manipulator, Sample and Cross Rotation (Automated)
• 2"-,4"-,6"-,8"- Substrate Multi-Sample Handling System, with Cooled Source and Substrate Shutter
• Research or Automated Mode through WINDOWS Data Acquisition and Processing Software
• Beam Flux Monitor, Quartz Crystal Microbalance, Residual Gas Analaysis, RHEED, Pyrometry, Ellipsometry
• Glove Box Connection for fast Sample Entry Load Lock Station, Etching amd Preparation Chamber, Vacuum Suitcase
• Future Upgrades and Add-On's, Expasion to Multi-Chamber System with Surface Analysis Capabilities
  
  

Optical Coating System	Fully Automated Machine Operation	High-Speed Batch Metallizers

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