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NanoDeposition
UHV Research Systems, for Thermal, Sputter and NanoCluster Deposition
Processes with In-Situ Growth Monitoring, RHEED, Surface Analysis, Ellipsometry
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Fully
Automated System Operation and Process Control
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RF
Plasma Atom- and Ion-Sources with Auto-Tuning, up to 1000 Watt Power for
10"CF Atom Production Sources
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NanoCluster
Generator with High-Resolution Mass Filter
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E-Beam
UHV-Evaporators with Single or Multi-Pocket Capabilities for Sequential
and Synchronous Operation
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Thermal
Gas Crackers for Generation of Atmic Fluxes of Reactive Species: Atomic
Oxygen , Atomic Chlorine etc.
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UHV
Magnetron Sputter Sources up to 8" CF Mounting