New iCNT-X280,
Carbon NanoTube-Reactor
- Proven Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) based reactor design for oriented carbon nanotube growth
- Applications: Research and development of carbon nanotube based structures and devices requiring spatially oriented growth of carbon nanotubes
- Single oriented nanotubes can be grown through appropriate catalyst patterning, or use of catalyst nano-particles
- Standard CVD nanotube growth recipes are also accommodated through the extended substrate holder temperature range (1100C max), and easy conversion to non-PE configuration
- Reactor chamber based on ultrahigh vacuum (UHV) chamber design standards for pure and consistent reaction environment
- Optional sample transfer system to UHV based surface characterization or vacuum based secondary processing units available (can be designed to meet specific user requirements)
- Standard configuration
includes precision gas handling system for acetylene, ammonia, purge gas
(N2), and one auxiliary channel for doping and other purposes
Application Notes:
Carbon
Nanotube Probes for High Aspect Ratio Scanning Probe Metrology 