New eLockIn 204 Digital Quad/Dual-Channel High-Frequency Lock-In Amplifier from Anfatec

New LowNoise High Frequency Upgrade for Current Amplification

New THERMAL DESORPTION SPECTROMETER TDS 40A1 with RGA from Stanford Research Systems

New Nano-Cylindrical Mirror Analyzer CMA-D 40B1

New Infrared Spectroscopy for Advanced BioOrganic Nano Research

New PM 200 6-Axis UHV Manipulator from OMNIVAC

New HP-XPS High Pressure X-Ray Photoelectron Spectroscopy Bio Reactor System

New CNT-Jet, Carbon NanoTube-GENERATOR

• PE-CVD Reactor, MFC-Regulation, Computer Controlled Operation, CNT-Optimized Production, High-Throughput
• Applications: Solar Cells, NanoMagnets, NANO-MEMS, NANO-CHIPS, Drug Delivery, NanoLight, BioNano Catalytic Converters, NanoFashion, Energy Transport and Transformation, NanoSuper Structures, NanoAnalysis
• UHV-Construction, Turbo-Pumped, Load Lock
• Adaptor for HP-JET UHV Bio-Reactor
• C2H2, NH3 Configuration Standard, Others Optional
• In Situ Growth Monitoring, Analytical Equipment Optional

New OrganoJet, Controlled Organic Injector from CreaTec

New Scanning Nearfield Microwave Microscopy, SQUIDS, Low-Noise Radio Frequency Amplifiers

• Superconducting Quantum Interference Devices and their Applications (RF-DC-Amplifiers+Electronics )
• Low-Noise Radio Frequency Amplifiers Based on SQUIDs
• Near-field Scanning Microwave Microscopes
• Nondestructive Evaluation Using SQUIDs
• Approved Technology form ez-SQUID Systems
• Educational Products and Demonstrators

New 'Britney' Alco-Paint from The Railroad Paint Shop

New NanoJet Miniature Macro-Molecular Beam Injector

New DNA Mapping, AIMs, ADMIX Platform and Genomaps by DNAPrint Genomics, Inc.

• DNAPrint® Genomics, Inc. is an Applied Science Company Focused on the Development and Marketing of Innovative Genetic Testing Products and Services. Our Scientists Aim their Research Towards Discovery of DNA Analysis Solutions to Serve Clients in Forensic Science, Genealogical Research, and Pharmaceutical Development.
• DNAWitness™2.5 for the Forensics Market: “Molecular” Eye-Witness, Quantitative DNA Analysis , Genetic Profiling, DNA Barcodes
• Pharmacogenomics, DNA-Tailored Drug Administration, Cancer Research and Treatment, Single Nucleotide Polymorphism ('SNP') Markers, Genetical Paternity Fingerprints, GENOTYPING
• ANCESTRYbyDNA™: Pan-Chromosomal Assay for Genetic Ancestry, Ancestry Informative Markers Mapping, Genetic Ancestry and Heritage Science and Reserach, BioGeographical Ancestry (BGA)

New Product of the Future

• This system is assigned for investigations of different materials (metals, alloys, ceramics, glass, fluxes, drosses) at high temperature (up to 2000°C) under ultra high vacuum or protective atmosphere used for observation their high-temperature behavior and for estimation of their various properties in order to understand complicated physico-chemical phenomena taking place at high temperature (e.g., surface tension, density and fluidity of liquid and semi-liquid materials, shrinkage of metals and alloys during cooling and solidification in liquid, semi-liquid and solid states, wetting and spreading kinetics of liquids on and over surfaces of refractory materials, infiltration kinetics of liquids in to porous materials, stability and reactivity of liquid metals and alloys in contact with refractory materials, gasification of materials during their heating or chemical reaction in the examined system at high temperature).

New LowNoise High Frequency Microscopy

New 30keV RHEED Gun with Magnetic Steering Coils, Beam Rocking, VIDEO-RHEED Option from CreaTec

• ML-RHEED - Magnetic Lens Reflection High Energy Electron Diffraction Gun, Differential Pumping
• for Diffraction Studies and Growth Monitoring in MBE/PLD/CVD/OLED - HP - Applications
• 30kV RHEED Energy, Magnetic Lenses
• Independent Grid Control, X, Y Deflection
• Air-Side Magnetic Lens and Deflection System
• Factory Aligned, Beam Blanking/Rocking Option
• UHV-Approved, Easy Filament Replacement and Alignement, Flight Tube for Filament Protection

New Ångstrom-Probe: Non-Destructive Measurement of Semiconductor Wafer Dopant Density

New UHV Wavelength Dispersive Spectrometer from Parallax Research

• WDS in True UHV Design with All Metal Seals
• Based on the Proven HEXS Spectrometer Concept
• Applications: Wavelength Dispersive Spectroscopy, Energy Dispersive Spectroscopy, X-ray Fluorescence (XRF) Spectroscopy, X-ray, EUV or XUV Lithography, Plasma Diagnostics, X-Ray Microscopy, Synchrotron X-Ray Optics, Micro-XPS or ESCA, Diffractometry
  
• Retractable X-Ray Collimating Optic, Hexagonal Diffractor Turret, Sealed Proportional Counter, X-Ray Concentrating Optics with Small Detector Window
• UHV Gate Valve and Pumping System for Achieving UHV Levels. This system IS NOT DIFFERENTIALLY PUMPED
• HEXS Data Acquisition and Processing Software

New NanoIndentation, NanoTribology, NanoFriction- and NanoHardness- Detection and AFM from Anfatec

New MBE and X-Ray Diffraction for In-Situ Real-Time Synchrotron Radiation Studies during MBE

• UltraHigh Resolution Process Control for Advanced Process Applications, New Compound Semiconductor Materials, New Materials Engineering, Protein Crystallography
• Applications: III-V Growth (GaAs, AlGaAs ), Advanced Metals Deposition, Rare Earth Oxides, HTC Giant SuperConductors, Bio Materials
• PHARAO Machine of the Paul-Drude Institute (PDI) at BESSY III, Adlershof, Berlin, FRG with UltraHigh Resolution Synchrotron Radiation
• High-Precision RHEED Source HP-4 with Energy Filter TOPAZ and SAFIRE VIDEO-RHEED for In-Situ Monitoring
• UHV-Design with High-Resolution Substrate Rotation
• Fully Automated Instrument Control with EMERALT

New in-vivo, Whole Animal, Macro Imaging Systems from Discovery Technology International

New IR-SNOM-Infrared-Scanning Near Field Optical Microscope for Understanding Molecular Processes

• SNOM for Nanoscale Chemical Imaging and Spectroscopy with NanoScale Resolution for Biological Applications
• Combined Infrared NanoSpectroscopy -Scanning Near Field Optical Microscopy- Atomic Force Microscopy - Scanning Near Field Infrared Microscopy - Topography - Superimposed IR-AFM Spectroscopy
• Knoll-Keilmann Aperture-Less Design
• Applications: Genetic Engineering, NanoSurgeries, BioSpectroscopy, High Resolution Chemical Spectroscopy
• New High Transmission Capillary for Low Sensitivity Signal Recovery and High Sensitivity IR-Detector with Selective Phase Resolution
• Fully Digital Electronics with NanoResolution Feedback Control

New NanoSphere Thin Film Deposition and VapourPhase Ω Resistive Evaporation Technology from Oxford

New NanoDeposition Science, NanoParticle Generators, RF Sources, E-Beam Evaporators from Mantis Deposition

• NanoDeposition UHV Research Systems, for Thermal, Sputter and NanoCluster Deposition Processes with In-Situ Growth Monitoring, RHEED, Surface Analysis, Ellipsometry
• Fully Automated System Operation and Process Control
• RF Plasma Atom- and Ion-Sources with Auto-Tuning, up to 1000 Watt Power for 10"CF Atom Production Sources
• NanoCluster Generator with High-Resolution Mass Filter
• E-Beam UHV-Evaporators with Single or Multi-Pocket Capabilities for Sequential and Synchronous Operation
• Thermal Gas Crackers for Generation of Atomic Fluxes of Reactive Species: Atomic Oxygen , Atomic Chlorine etc.
• UHV Magnetron Sputter Sources up to 8" CF Mounting

New Energy Filter 'Beatrix' for HR-LEEM/HR-PEEM

New Aberration-Corrected RMC 24 X-Ray Monochromator with New Dual-Lens Focussing Optics

New DNA Computer

• Surface Analysis System (XPS, ESCA, UPS, LEED, AES, ISS, Mass Spectroscopy, Depth Profiling)
• Micrscopy Chamber (AFM, STM, LEEM, PEEM)
• Sample Preparation Chamber (MBE, PVD, CVD, PLD)
• Load Lock for Sample Introduction
• Highly Reliable Long-Time Operation Guaranteed
• Multi-Technique Capabilities, Versatile Design
• Heatable/Coolable Sample Manipulators
• Completely Oil-Free Vacuum System
• Mu-Metal Central Analysis Chamber
• All Instrument Functions are Remote Controlled
• UHV Design, System is Fully Bakeable

New IPES Inverse Photoelectron Spectroscopy Detector for Unoccupied Density of State Analysis

New Energy Analyzer Package EA 120 MCD for XPS, SSXPS, MXPS, UPS, AES, SAM, ISS

• True 180° Hemispherical Energy Analyzer EA 120 MCD, with 120 mm analyzer mean radius
• Fringe Field Correction for Ultimate Energy Resolution
• Mu-Metal-Liner for analyzer lens and hemisphere
• 6 different entrance slits (selectable, indexed) for various spot sizes and solid angles of acceptance
• 5-Channeltron Detector Array MCD 120
• UltraHigh Stability Power Supplies and Control Electronics for Full Analyzer Remote Control
• SPECTRA Software Package for Data Acquisition and Data Processing (XPS, UPS, AES, ISS)

New AFM Cantilevers, SNOM Transmitters, Microgrippers, Nano-Manipulators from NASCATEC

New Femto-LEED, LEED - AES with Delayline Detector, Microchannel Plates, mini-LEED, from OCI

New AFM Module for UHV LT-STM Spectrometer from CreaTec

New ArtOf 10k, an Electron Spectrometer for Fast and Highest Resolution ARPES from VG Scienta

New ELMITEC Electrostatic Flange-On LEEM with Magnetic Beam Splitter

• LEEM IV, Low Electron Emission Microscope
• Low Cost, Ease of Use
• Full Magnitec Shielding
• LEEM/LEED and PEEM modes computer controlled
• High Resolution < 20 nm
• Field of view in LEEM mode 3-75 µm
• Field of view in PEEM mode 3-85 µm
• LEEM IV Options: Sample Manipulator, LN Sample Cooling, Preparation Chamber, Vacuum System

New Advanced Thin-Film Monitoring, Reflectometry, Interferometry, Film Roughness Measurements from ORS

New Organic Molecular Compound Evaporators for OLED Deposition from CreaPhys

New Spintronics, Scanning Magnetic Microscopes, Magnetic Sensors

New ELMITEC Electrostatic Flange-On LEEM with Magnetic Beam Splitter

• LEEM IV, Low Electron Emission Microscope
• Low Cost, Ease of Use
• Full magnitec shielding
• LEEM/LEED and PEEM modes computer controlled
• High Resolution < 20 nm
• Field of view in LEEM mode 3-75 µm
• Field of view in PEEM mode 3-85 µm
• LEEM IV Options: Sample Manipulator, LN Sample Cooling, Preparation Chamber, Vacuum System

New Magnetron Sputter Equipment, High Vacuum Magnetron Sputtering Guns

New Laser Substrate Heater with High Power Diode Laser from Surface

• Advanced Processing: Cleaning, Heating, Annealing for UHV, MBE, PLD, PVD, CVD, etc. Applications
• Better Vacuum at High Substrate Temperature: 1200 °C at 10-8 mbar
• Higher Temperatures - Independent of the Process Pressure: 1300°C, 1400°C...
• Any Temperature Ramp Possible
• Flash Heating of Thin Films
• Flash Cristallization of Amorphous Thin Films
• Focussing optic with light fiber, High power diode laser module with power supply, Control unit for advanced laser processing with high speed Linux PC, Laser cooling

New Recirculation Chillers, Air-Blast Coolers and Water-Water Heat Exchangers from ATC

• Compact, Economical and Versatile Design to Optimise Performance and Reliability
  
• Excellent Service and Technical Back Up
• Applications: Microscopes, Semiconductor Processes, Lens Manufacturing, Machine Tools, Digital Printing
• Unique Heat Transfer Fluid: Hexid Extends Chiller Lifetime, Prevents Frost and Protects Against Growth of Damaging Bacteria/Algae
• Extensive Model Selection for Cooling Capacity from Less than 500 Watt to over 9000 Watt
• Full Control of Temperature, Versatile Flow Rates and Pressures, Very Low Noise Levels

New MOCVD Reactor for Research and Development Applications from ANNEALSYS

• Low Cost 2-inch and 4-inch MOCVD Reactors
• Applications: Semiconductor, High k Dielectric, Superconductors, Ferroelectric, Colossal Magneto Resistance, Thermal Coatings, Oxides
• Direct Liquid Injection Vaporizer, 'Cold-Wall'-Design, Rotating and Heating Substrate,
• Fully Automated and Manual Operation,
• Up to 8 process gas lines with digital MFC
• Vertical furnace for process up to 1000 °C
• Up to 4 precursors or precursor mixtures

New The Golden STM, Scanning Tunneling Microscope, SPM Controllers, Lock-In Amplifiers and Preamplifiers

• Golden (Chemically Resistive) Vibration Isolated STM Body With Implemented Preamplifier
• Provided Modes: Constant Height Mode, Constant Current Mode, Distance Spectroscopy Of The Tunneling, Tunneling Voltage Spectroscopy, dI/dU Spectroscopy
• Computer with PCI Board Based SPM Controller
• Anfatec Scan & Anfatec Present
• 19 “ STM Controller (Extra Low Noise 24 Bit Converters)
• HV Display For z-Direction
• High Voltage Amplifiers For The X-Y-Tube Scanning
• Optional: PC Controlled bi-Potentiostat And Electrochemical Cell
  

New UHV- High Pressure Reactor for Biological Experiments and NanoSurface-Technologies

• UHV High-Pressure Reactor for: APMOCVD, LPMOCVD, ALD, CBE for Organic, Biology, BioOrganic Semiconductors, NanoTechnology, BioOrganic Surface Chemistry
• Plasma Generators, MetalOrganic -Sources, NanoJet - Nano-Particle Liquid Injector, Plasma Ion Source, Magnetic Field Application, Plasma Generators with Controlled Gas Inlet Systems and ALD fast-acting high temperature operation pneumatic valves, Laser Viewports for Laser Heating, Abrasion Deposition (PLD), Brewster and Glancing Angle Measurements, Optical Growth Diagnosis
• RGA Residual Gas Analysis, differentially-pumped RHEED Gun including shutter-protected RHEED Screen, Temperature and Growth Monitors, Flux Measurements and Quartz-Crystal Microbalance.
• UHV Technology, Bakeout, oilf-free vacuum system

New UFO XPS/UHV - Universal Fotoelectron Omni SPECtrometer System (UFO-SPECS)

• Nondestructive Characterisation of Advanced Materials with the Following Features:
• Highest ESCA Performance and Energy Resoultion
• VT-AFM/STM with Atomic Resolution
• Monochromatic X-ray Source with High Count Rates
• UHV Radial Sample Distribution System
• Sample Preparation and Materials Deposition Chambers
• Multi-Technique Capabilities
• Heatable/Coolable Sample Manipulator
• UHV System with Excellent Basic Vacuum
• UHV System with Excellent Basic Vacuum

New UHV Wafer Heater System with Laser or Quartz Heaters

• UHV Heating Systems for Wafers up to 12" in diameter
• Heating of Wafer in Load Lock or Sample Treatment Chamber, Semiconductor Production
• Ultra-Fast Heating Ramps, Automated Heating Operation
• Heating in Controlled Atmospheres (O, N, NO etc) from UHV to 1000 mbar, Mass Flow Controller Regulated
• Quartz Heaters with Uniform Heating Performance
• Integrated Water Cooling Jacket
• Quartz Lamps easily replaceable
• Thermocouple: Type K/C
• Power Supply and PID-Controller
• Laser Heating System Optional

New Dual E-Beam UHV Evaporator Cluster for Si/Ge Deposition

• UHV Single-/Multi-Pocket E-Beam Evaportor for Si/Ge Deposition
• Electron emitter is designed with 270° beam deflection
• Horizontal or Vertical Mounting and Evaporation
• High Voltage/High Current Power Supply with Stable Output
• Thermocouple and PID-Controller
• Magnetic Shielding, No Cross-Over
• Manual/Electrical/Pneumatical Shutter System
• Integrated Water-Cooling Shroud
• Quartz Crystal Microbalance Option
• for Semiconductor, MBE, PVD, Optical, Deposition-Applications
• UHV Design and Performance to UHV Specifications
• Copper Hearth Evaporators up to 50 cc Capacity.

New Smart Crystal Sensor Thin Film Thickness Measurement System from VBS

• Up to 500º C High Temperature HV/UHV Crystal Sensor System for MBE, ALD, CVD, PVD, OLED, etc.
• Eliminates Thickness Measurement Errors Caused by Temperature Shifting of the Crystal Resonance Frequency
• Diminishes Rate Measurement Instability, Largely Caused by the Buildup of Film Stresses
• Matching of the Crystal Temperature to the Substrate Temperature
• Super Quartz™ Gallium Phosphate (GaPO4) QCMs
• Quartz Crystal Film Thickness Monitor/Controller Included

New DLC (Diamond Like Carbon Coating) from Mustang Vacuum Systems

• Extremely Hard Coating (Like Diamond)
• DLC Coatings Deposited on Almost any Vacuum Stable Substrate
• Providing an Extremely Smooth Surface that Reduces Friction and Protects Against Wear and Corrosion
• Applications: Medical Instruments, Tool Coatings, Drill Bits, Automotive Parts, IPOD® Cases, EMI/RFI Shielding
• Fully Automated, Fast Turn-Around Production Cycles

New Spin Polarized Electron Gun for LEEM and PEEM from ELMITEC

• Spin Polarized Emitter: GaAs, Zn doped with Cs, O2 Activation
  
• IR light source: 30 mW Diode Laser,780 nm with circular polarizer and focusing lenses
  
• Polarization Rotation in Condensors: 180 deg.
• Polarization Rotation in Sector Field: 0..90 deg. vs. Beam Axis, in Sector Plane
• IR Light Source: 30 mW Diode Laser,780 nm with Circular Polarizer and Focusing Lenses
  
• Degree of Spin Polarization: 27%
• Typical Emission Current: 1 µA

New Digital Universal SPM Controller

New UMS Universal Mass Spectrometer

• Multifunctional Leak Detector
• Wide Range Pressure Mass Analyser,
• System for Thermal Desorption Spectroscopy (TDS)
• Simultaneous Mass Analysis for 10 Gases
• Intuitive and User Friendly Operation
• Small Size, Low Weight and Silent Operation
• Fully Computer Controlled through USB-Interface

New Wafer Profiler - ECV Profiling (Electrochemical Capacitance Voltage Profiling) from WEP

• WAFER PROFILER CVP21for Group IV-, III-V-, Ternary III-V- , Quaternary III-V-, Nitrides and II-VI- Semiconductors
• ECV Profiling is a Valuable Tool for Semiconductor Analysis; it is superior over Hall, SIMS (Secondary Ion Mass Spectroscopy) and SRP (Sheet Resistance Profiling)
• Substrate Size up to 8 inch (Conductive or Insulating)
• Easy-to-use and Calibration Free Operation!
• Full Automatic 'Dry in – Dry out' Sample Processing
• Measurement of Doping 'n and p' (Al,In)GaN or AlInN due to Etch Algorithms Producing Fast Mirror-Like Etchings
• Measurements of Concentrations below 1014 cm-3
• Evaluation of Photo-Electro-Chemical (PEC) Etching
• Determination of Thickness of the Epi Layer
• Fully Automated Operation with Wafer Stepping and CCD-Camera Process Control

New MicroOptics, Optical Components, Optical Coatings from International Micro Photonix

• High Reflective Mirrors: Reflectivity greater than 99.5%
• Optical Windows: with Transmission greater than 99.5%
• Multi Function Components: Optical Windows, Patterned Beamsplitters, Polarizers, Waveplates, Combination Mirrors, Optical Materials, Laser Crystals
• Prisms: with Antireflective Coating, Reflective Hypotenuse
• Etalons: Analytical and Telecommunication
• Patterned Beam Splitters: Multilayer Dielectric and Metallic
• Dicing, Fiber Polishing (Flat, Angled, and Radius FP-spec)
• Coatings for Wavelengths from 180 nm to 2.5 Microns, including Antireflective, Metallic and Multi-Layer Dielectric Reflectors
• Substrates: Fused Silica, BK-7, Silicon, and Specialty Glass
• Ion Beam Assisted PVD Coating Processes

New SURFWARE - Communication and Support Software from SURFACE

• New Technical Online Support, Training and Maintenance Tool for Scientific Instumentation
• Easy PC Implementation, Low Bandwidth Requirements, Direct Video and Audio Access
• Enables Full Remote Control of Customer System
• System Failure Diagnosis Program
• Easy Integration Into Any Existing System
• Reduces Support Costs and Increases the Overall Customer Satisfaction

New High Power, Non Contact, Flash Vaporizer for Solid and Liquid Precursors from KEMSTREAM

• High Power (1.7kW), Non Contact, Flash Vaporizer
• Delivery System For Solid And Liquid Precursors
• For Research & Development, Pilot Production and Production.
• Processes addressed: MOCVD, batch ALD, PECVD, in line industrial CVD, All CVD And All Gas-Phase Processes With One Or Two Liquid Inlets
• Efficiently Vaporization of Low Vapour Pressure Solids Solved In Organic Solvents And Few Tens Of g/min Of Liquids Such As TEOS
• Temperature Range up to 300º C
• 3 Heating Zones - 3 Thermocouples - 3 PID Controllers
• Automated Operation, Computer Interface
• Power Control Unit (PCU) for Heating Control

New XPS Databases, XPS Handbooks, Monochromatic XPS Spectra, Libraries, XPS-AES Data Processing Software

• SpecMaster: Digital XPS Data-Base Systems, designed to be a practical tool for everyday use
• Library of >40,000 reference spectra; 8,500+ Reference spectra; 32,000+ Practical Studies
• Spectral Data Processor: Advanced Data Processing Software for XPS and AES spectra
• Handbooks of Monochromatic XPS Spectra for Elements, Native, Binary and Rare Earth Oxides, Polymers, Semiconductors, Nitrides, Carbonates etc.
• XPS Data Wall Chart to Assist Peak-Fitting

New Aberration Corrected LEEM and PEEM from ELMITEC

• Aberration Corrected LEEM / PEEM with calculated resolution <3 nm at 8 times more intensity!
  
• ELMITEC LEEM IV: Electrostatic Flange-On LEEM with Magnetic Beam Splitter
  
• ELMITEC LEEM V with 90° Sectorfield, achieved resolution: 4.9 nm
• ELMITEC PEEM III with best achieved resolution: 8.2 nm
  
• ELMITEC PEEMSpector: new, small, fully electrostatic photoelectron microscope.
  
• Imaging Energy Analyzer with Energy Resolution: <0.2eV
• Spin Polarized Electron Source with Spin Manipulator
• High Precision and High Stability Sample Manipulators

New AFM, STM, SPM Controllers, Lock-In Amplifiers and Preamplifiers for SPM, SPM Accessories

• Scanning Probe Microscopes, Scanning Tunneling Microscopes, Atomic Force Microscopes, from ANFATEC
  
• AFM with: NonContact-AFM, CM, LFM, MFM, dynamic EFM, Kelvin Probe Force Microscopy, Mixed Frequency Detection, Conduction AFM
• Golden STM for Solids/Liquids, with dI/dV spectroscopy, including etching tool for tungsten tips
  
• Universal SPM Controller with WINDOWS-based SPM software, fully digital system control
• Fully digital HF-LockIn Amplifier, Quad Channel, Oscilloscope, Spectrum Analyzer

New Manipulators, Goniometers and Mechanical Feedthroughs

• UHV Vacuum Sample Manipulators
  
• XY-, XYZ-Manipulators, 4-,5-, 6-Axis Manipulators,
• Z-Motion Device, Sample Transfer Systems
• Sample Cooling and Sample Heating, Sample Heating Power Supplies
• Stepper Motors, Motorized Motions, UHV Goniometers
• Rotary Feedthroughs, Differentially Pumped Rotary Feedthroughs, Linear Feedthroughs
• Wobble Sticks with Gripping and Rotating Tip

New ALD - Atomic Layer Deposition

• ALD Reactor Batch Tool for Industrial and R&D Applications
• Applications: Optical Filters and Films, Semiconductor and Compound Semiconductors, Dielectric Layers, Diffusion Barriers and Passivation Layers, NanoTechnology, MEMS, Organic Deposition
• Universal Precursor Delivery System: Gases, Liquids, Solids
• Very High Film Uniformity, Homogeneity, and Density; Atomic Level Control
• Multi-Reactor Systems with complete Vacuum Pumping Facilities, Gas Purging, Fully Computer Controlled Operation PLC with PC Interface
• Maximum Temperature up to 550°C, Deposition Pressure <20mbar

New New Sales and Service Center for the United States and Canada and Latin America

• With the beginning of March 2006 SPECS opens up a new, expanded US Sales and Service Center. Starting March 1, 2006 you may reach us at our new address:
  

  SPECS Technologies Corporation
  3318 Plantation Dr.
  Sarasota, FL 34231
  ph: 941.362.4877
  fax: 941.364.9706
  support@specs.com

New SPECS MultiMedia Video Gallery

• Video Clip of LT-STM: Cu on Cu(111) Atomic Surface Diffusion
• Diffusion of Pt on Pt(110)-(1×2) with VIDEO-Rate Aarhus STM
• 3D Atom Map of Mg/Si-Percipitates in Aluminium Alloy
• RoBoMate™Video of Digital NanoManipulation System

New NanoRobotics, NanoPositioning, NanoManipulation, NanoMotion, NanoMotors and NanoStages

• for Biology, Medicine, MEMS, Semiconductor, Photonics, Fiber Optics, Microelectronics
• RoboMate NanoRoboter with Angular/Linear Motorised Positioning System
• Piezo Motor Driven NanoStages and Linear Transfer Devices with NanoResolution over Large Travel Range up to 100mm!
• Software Driven NanoMotion with Full Digital DSP Control enabling NanoSmoothness
• Virtual Point Technology for NanoPositioning at Indefinetively Variable Angles
• Resolution 0.4 nm, Angular Resolution 0.5 arc/sec
• Long Term Stability less than 2nm/hour drift at 20°C

New BioJet Macro-Molecular Beam Injector